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00416nam ac200169 k 4500
000003549333
20220101120000
ta
010731s1978 US 000 eng
▼a 211070
▼c 211070
▼l WM0004006224
▼a TK7871.15.F5
▼a TK7871.15.F5
▼b T43
▼a THIN FILM PROCESSES/
▼d VOSSEN,JOHN L
▼a NEW YORK:
▼b ACADEMIC,
▼c 1978.
▼a 564p.
▼a VOSSEN,JOHN L
▼a 단행본
| 자료유형 : | 단행본 |
|---|---|
| 분류기호 : | TK7871.15.F5 |
| 서명/저자사항 : | THIN FILM PROCESSES/ VOSSEN,JOHN L |
| 발행사항 : | NEW YORK: ACADEMIC, 1978. |
| 형태사항 : | 564p. |
| 개인저자 : | VOSSEN,JOHN L |
| 언어 | 영어 |
WMO199910175
권 호 : 564
발행년 : 1978
서 명 : THIN FILM PROCESSES
발행처 : VOSSEN,JOHN L
목차
1. PHYSICAL METHODS OF FILM DEPOSITION
2. GLOW DISCHARGE SPUTTER DEPOSITION
3. CYLINDRICAL MAGNETRON SPUTTERING
4. THE SPUTTER AND S-GUN MAGNETRONS
5. PLANAR MAGNETRON SPUTTERING
6. ION BEAM DEPOSITION
7. CHEMICAL METHODS OF FILM DEPOSITION
8. DEPOSITION OF INORGANIC FILMS FROM SOLUTION
9. CHEMICAL VAPOR DEPOSITION OF INORGANIC THIN FILMS
10. PHYSICAL-CHEMICAL METHODS OF FILM DEPOSITION
11. PLASMA DEPOSITION OF INORGANIC THIM FILMS
12. GLOW DISCHARGE POLYMERIZATION
13. ETCHING PROCESSES
14. CHEMICAL ETCHING
15. PLASMA-ASSISTED ETCHING TECHNIQUES FOR PATTERN DELINEATION
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