| 자료유형 : | 기사 |
|---|---|
| 기사명 : | Comparison of Retention Characteristics of Ferroelectric Capacitors with Pb(Zr,Ti)O3 Films Deposited by various Methods for High-density Non-volatile Memory |
| 저자 : | Shin, Sangmin|Hofmann, Mirko |
| 발행사항 : | A Publication of the Institute of Electronics Engineers of Korea : Seoul , 2003 |
| 수록잡지명 : | Journal of Semiconductor Technology and Science[2001-2010] : 2003. September Vol.3 No.3 |
| 페이지 : | 132 |
서평쓰기