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  191204t20192019enk fo 000 0 eng d

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  ▼a  1785616560

• 020

  ▼a  9781785616563
  ▼q  (electronic bk.)

• 020

  ▼z  9781785616556

• 020

  ▼z  1785616552

• 035

  ▼a  2345949
  ▼b  (N$T)

• 035

  ▼a  (OCoLC)1132297460

• 040

  ▼a  STF
  ▼b  eng
  ▼c  STF
  ▼d  OCLCO
  ▼d  UIU
  ▼d  CUS
  ▼d  OCLCF
  ▼d  EBLCP
  ▼d  N$T
  ▼d  248023

• 050

  ▼a  TK7871.85

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  ▼a  A0130E
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  ▼a  A6170
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  ▼a  A7855
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  ▼a  A7860
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• 072

  ▼a  B2550R
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• 082

  ▼a  621.38152

• 245

  ▼a  Characterisation and Control of Defects in Semiconductors /:
  ▼c  edited by Filip Tuomisto.

• 260

  ▼a  Stevenage:
  ▼b  The Institution of Engineering and Technology,
  ▼c  2019.

• 300

  ▼a  1 online resource (596 pages).

• 336

  ▼a  text
  ▼b  txt
  ▼2  rdacontent

• 337

  ▼a  computer
  ▼b  c
  ▼2  rdamedia

• 338

  ▼a  online resource
  ▼b  cr
  ▼2  rdacarrier

• 490

  ▼a  IET Materials, Circuits & Devices Series;
  ▼v  45

• 520

  ▼a  The following topics are dealt with: semiconductor defect control; semiconductor doping; ion beam effects; ion implantation; elemental semiconductors; silicon; electrically active defects; point defect luminescence; vibrational spectroscopy; magnetic resonance methods; muons; positron annihilation spectroscopy; first principles methods; microscopy; 3D atomic-scale studies; ion beam modification; and ion beam analysis and channelling.

• 588

  ▼a  Online resource; title from PDF title page (IET Digital, viewed January 13, 2020).

• 590

  ▼a  Master record variable field(s) change: 050

• 650

  ▼a  Ion implantation.

• 650

  ▼a  Magnetic resonance.

• 650

  ▼a  Semiconductor doping.

• 650

  ▼a  Semiconductors
  ▼x  Materials.

• 650

  ▼a  Silicon.

• 650

  ▼a  Ion implantation.
  ▼2  fast
  ▼0  (OCoLC)fst00978590

• 650

  ▼a  Magnetic resonance.
  ▼2  fast
  ▼0  (OCoLC)fst01005777

• 650

  ▼a  Semiconductor doping.
  ▼2  fast
  ▼0  (OCoLC)fst01112124

• 650

  ▼a  Semiconductors
  ▼x  Materials.
  ▼2  fast
  ▼0  (OCoLC)fst01112237

• 650

  ▼a  Silicon.
  ▼2  fast
  ▼0  (OCoLC)fst01118631

• 650

  ▼a  crystal defects.
  ▼2  inspect

• 650

  ▼a  ion beam effects.
  ▼2  inspect

• 650

  ▼a  ion implantation.
  ▼2  inspect

• 650

  ▼a  luminescence.
  ▼2  inspect

• 650

  ▼a  magnetic resonance.
  ▼2  inspect

• 650

  ▼a  microscopy.
  ▼2  inspect

• 650

  ▼a  positron annihilation.
  ▼2  inspect

• 650

  ▼a  semiconductor doping.
  ▼2  inspect

• 650

  ▼a  semiconductor materials.
  ▼2  inspect

• 650

  ▼a  silicon.
  ▼2  inspect

• 655

  ▼a  Electronic books.

• 700

  ▼a  Tuomisto, Filip,
  ▼e  editor.

• 830

  ▼a  Materials, circuits and devices series;
  ▼v  45.

• 856

  ▼3  EBSCOhost
  ▼u  http://search.ebscohost.com/login.aspx?direct=true&scope=site&db=nlebk&db=nlabk&AN=2345949

• 938

  ▼a  ProQuest Ebook Central
  ▼b  EBLB
  ▼n  EBL6026414

• 938

  ▼a  EBSCOhost
  ▼b  EBSC
  ▼n  2345949

• 990

  ▼a  강리원

• 991

  ▼a  eBook

• 994

  ▼a  92
  ▼b  N$T