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00697nam 2200229 k 4500
000000639515
2051130121000
010413s1980 us a 001a eng
▼a 0-471-07828-X:
▼c $39.95
▼a 248023
▼c 248023
▼l EM85306
▼a 537.52
▼a 537.52
▼b G466g
▼a Chapman, Brian.
▼a Glow discharge processes:
▼b sputtering and plasma etching/
▼d Brian Chapman.
▼a New York:
▼b John Wiley & sons,
▼c 1980.
▼a xv,406p.:
▼b ill.;
▼c 24cm.
▼a Includes bibliographical references(p.397-400) and index
▼a GLOW
▼a DISCHARGE
▼a PROCESSES
▼a Sputtering
▼a Glow discharges
▼a Plasma etching
▼a 단행본
▼a 537.52
▼b G466g
| 자료유형 : | 단행본 |
|---|---|
| ISBN : | 0-471-07828-X: |
| 분류기호 : | 537.52 |
| 개인저자 : | Chapman, Brian. |
| 서명/저자사항 : | Glow discharge processes: sputtering and plasma etching/ Brian Chapman. |
| 발행사항 : | New York: John Wiley & sons, 1980. |
| 형태사항 : | xv,406p.: ill.; 24cm. |
| 서지주기 : | Includes bibliographical references(p.397-400) and index |
| 분류기호 : | 537.52 |
| 언어 | 영어 |
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